Spritzenziel
(9)
Hersteller von Silbersputter-Zielmaterialien 99,95% Rundsputter-Ziel-Sliver-Blatt
Preis: ＄500-600/kg
MOQ: 1pieces
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:silver Sputtering Target, Sputtering Target 99.95%, round target sliver sheet
shape round plate purity 99.999 Material silver size customized FAQ Q1: Can I order a sample quantity ? A1: Yes, we have no MOQ. Q2: Can I add my logo on the boxes/cartons? A2: Yes,OEM and ODM are available from us. Q3: What are the benefits of being a distributor ? A3: Special discount Marketing pr... Mehr sehen
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Fabrik-Direktlieferung 99,95% Platin Sputtering Ziel Platin Pt Sputtering Ziel
Preis: ＄3000-7700/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:99.95% platinum target, platinum target 99.95%, PT platinum target odm
Factory direct supply 99.95% Platinum Target,Platinum Pt Sputtering Target A platinum sputtering target is a disc-shaped material made of high-purity platinum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from ... Mehr sehen
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Hohe Reinheit Sputtering Gold Ziel 99,999% Für Magnetron Sputtering Beschichtung
Preis: ＄150-550/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:99.999% rare metal alloys rare, rare metal alloys 99.999% rare, rare metal alloys 99.999% rare
High purity Gold Sputtering Target 99.999% for Magnetron Sputtering Coating A gold sputtering target is a disc-shaped material made of high-purity gold metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the tar... Mehr sehen
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Hohe Reinheit 4N5 Titanspritzerziele Runde Scheiben Ziel für die Beschichtung
Preis: ＄270-290/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:purity round target, 4N5 round target, titanium sputtering ISO9001
high purity 4N5 titanium sputtering target round discs target for coating A titanium sputtering target is a disc-shaped material made of high-purity titanium metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from t... Mehr sehen
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Tantalplatte 99,95% reines Tantal Sputterziel / Tantalplatte / Blech / Scheibe
Preis: ＄280-300/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:99.95% Pure Sputtering Target, Tantalum Sputtering Target, tantalum Plate disc
Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms... Mehr sehen
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99.95% Hohe Reinheit Mo1 Sputterziel Molybdän Spezialteile Molybdän Sputterziel
Preis: ＄58-65/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:99.95% High purity Sputtering Target, Mo1 Sputtering Target, molybdenum sputtering ISO9001
99.95% High purity Mo1 molybdenum special parts molybdenum sputtering target Molybdenum sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ... Mehr sehen
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Pvd Chrom-Sputterziel / Chrom-Sputterziel Preis / Cr-Sputterziel
Preis: ＄35-60/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:pvd chromium target, chrome chromium target, Cr chrome target
pvd chromium sputtering target/chrome target price/Cr sputtering target Chromium sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected... Mehr sehen
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Zirkonium-Sprutzing-Ziel Zr-Ziel für die Sputteringbeschichtung
Preis: ＄35-45/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:Sputtering Zirconium Target, Zr Zirconium Target, Zr Target For Sputtering Coating
Zirconium Sputtering Target Zr Target For Sputtering Coating Zirconium sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and depos... Mehr sehen
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Laborausrüstung 5n/6n 99,999% Hochreine Si Silizium Sputtering Ziel optische Beschichtungsmaterialien
Preis: ＄70-90/kg
MOQ: 10kg
Lieferzeit: 10-15days
Marke: HaiChuan
Markieren:5nSputtering Target, 6n 99.999% Sputtering Target, silicon sputtering Optical Coating
lab equipment 5n/6n 99.999% High Pure Si Silicon Sputtering Target Optical Coating Materials Silicon sputtering targets are a type of material used in the process of sputtering, which is used to deposit thin films of materials onto a substrate. Sputtering is a process in which atoms from the target ... Mehr sehen
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