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Metallspritzenziel
(30)98 x 14 mm Titanscheibe 97 x 16 mm ASTM F67 Für Oralprothesen
Preis: $32.00 - $38.00/ Piece
MOQ: 1 Piece
Lieferzeit: 15~20 work days
Marke: CSTI
Markieren:ASTM F67 Titanium Disc, 98mm Titanium Disc, 97mm titanium discs
Titanium target is commonly used in the production of oral dentures, specifically for the manufacturing of implant-supported dentures. Titanium is a biocompatible material that is resistant to corrosion and has a high strength-to-weight ratio, making it an ideal material for dental implants. In the ... Mehr sehen
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99.9%-99.999% Purity Titanium Targets The Key to Successful Thin Film Deposition
Preis: USD 60.0/pc - USD 180.0/pc
MOQ: 1 piece
Lieferzeit: 15-25 work days
Marke: Changsheng
99.9%-99.999% Purity Titanium Targets The Key to Successful Thin Film Deposition We offer Titanium targets for all major PVD systems, and can be tailored for applications ranging from ultra-high performance to minimal-cost needs. Titanium Targets can be made in purities ranging from 3N to 5N+. Throu... Mehr sehen
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OEM PVD 5N+ 99.9995% Titanium Targets High Purity Semiconductor Targets Thin Films
Preis: USD 60.0/pc - USD 180.0/pc
MOQ: 1 piece
Lieferzeit: 15-25 work days
Marke: Changsheng
OEM PVD 5N+ 99.9995% Titanium Targets High Purity Semiconductor Targets Thin Films We offer high purity Titanium targets for all major PVD systems. Titanium Targets can be made in purities ranging from 3N to 5N+. Through control of the target metallurgy, oxygen content, surface finish and assembly t... Mehr sehen
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Indiumgebundene HIP-Metall-Sputterziele für verschiedene Filmbeschichtungen
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:HIP Metal Sputtering Target, Indium Bonded Metal Sputtering Target, Film Coatings Metal Sputtering Target
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99.99% Reinheit HIP Rund elektrostatische Pulverbeschichtungspistole mit polierter Oberflächenveredelung
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:HIP Round Electrostatic Powder Coating Gun, 99.99% Purity Electrostatic Powder Coating Gun,
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Indiumgebundenes Metall mit hoher Reinheit als Sputterziel für verschiedene Substrate
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Various Substrates Sputtering Target, Indium Bonded Metal Sputtering Target, High Purity Sputtering Target
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Rundpolierte Fördermaschinen Metalldetektor Reinheit 99,99%
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Round Polished Conveyor Metal Detector Machines, 99.99% Purity Conveyor Metal Detector Machines,
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Individuell angepasster runder Schmelzgleimpistol Freifall-Metalldetektor für polierte Oberflächen
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Customized Round Hot Melt Glue Gun, Freefall Metal Detector, Polished Surfaces Hot Melt Glue Gun
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Hochreine Sputterziele für die Dünnschichtdeposition mit präziser Kontrolle
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Thin Film Deposition Sputtering Targets, Precise Control Sputtering Targets, High Purity Sputtering Targets
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Individuell angefertigte Einzel-/Mehrfachreinigungsspritzziele mit polierter Oberfläche
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Customized Sputtering Targets, Multiple Purity Sputtering Targets, Polished Surface Sputtering Targets
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99.99% Reinheit Metallziel mit polierter Oberflächenkristallstruktur
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Crystal Structure Metal Sputtering Target, Polished Surface Metal Sputtering Target, 99.99% Purity Metal Sputtering Target
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Individuelles Metallziel für Sputterbeschichtungen Ein- oder Mehrfachkonfiguration Ra 0,8 Um
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Single Configuration Metal Sputtering Target, Multiple Configuration Metal Sputtering Target, Customized Metal Sputtering Target
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Indium-Legierung Sputtering Ziel mit kundenspezifischen Substraten poliert und anodiert
Preis: Negotiable
MOQ: Negotiable
Lieferzeit: Negotiable
Markieren:Customized Substrates Sputtering Target, Polished Sputtering Target, Anodized Sputtering Target
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99.995% Reinheit Titan Sputtering Ziel PVD Beschichtung Rotorrohr Ziele
Preis: USD 100.0/pc - USD 180.0/pc
MOQ: 1 piece
Lieferzeit: 15-25 work days
Marke: Changsheng
99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so ... Mehr sehen
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Ti-Ti-Al Zr Cr Metall-Spruttering-Ziel für PVD-Beschichtung 100*40mm Warmverkauf
Preis: USD24/pc
MOQ: 200pcs
Lieferzeit: 15~20 work days
Marke: Changsheng
Markieren:PVD Coating Metal Sputtering Target, 100*40mm Metal Sputtering Target,
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Mehr sehen
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Titan-Block des Gr5-Eli Ziel-Grad-23 für Zahnimplantat ASTM F136
Preis: 35usd/kg
MOQ: 10pc
Lieferzeit: 10-15days
Marke: Changsheng
Markieren:Gr23 Titanium Target Block, Dental Implant Titanium Target Block, ASTM F136 Target Block
DescriptionTitanium Gr5-Eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI)Titanium Gr5-Eli Target is a titanium alloy that is composed of 6 % aluminum, 4 % vanadium, and extra low interstitial elements (ELI).Titanium Gr23 Targe... Mehr sehen
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Titanspritzerziel Ti zur Plattierung Ti Ti-Al Zr Cr für PVD-Beschichtung
Preis: 23usd/pc
MOQ: 50pcs
Lieferzeit: 10-15days
Marke: Changsheng
Markieren:Polished Titanium Sputtering Target, Plating Titanium Sputtering Target, Titanium Metal Sputtering Target
Description Titanium Sputtering Target, Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, Titanium is lustrous and silvery-white in appearance. Titanium has a melting point of 1660°C, a density of 4.5 g/cc, and a vapor press... Mehr sehen
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Hochreine Chrom-Chrom-Sputter-Zielplattenform für PVD-Beschichtungsmaschine
Preis: USD24/pc
MOQ: 200pcs
Lieferzeit: 15~20 work days
Marke: Changsheng
Markieren:High Purity Chromium Sputtering Target Plate, High Purity Target Plate, PVD Coating Machine Target Plate
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Mehr sehen
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Herstellpreis Titan 100*40mm 100*45mm,95*45mm Beschichtung
Preis: USD24/pc
MOQ: 200pcs
Lieferzeit: 15~20 work days
Marke: Changsheng
Markieren:Factory Price Customized titanium targets, Coating Titanium Targets,
Description Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities and shapes, by combining our technologies of melti... Mehr sehen
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Titanium SS 304 PVD Beschichtung Sputtering Ziele 100*40mm 95*45mm 98*10mm für Industrie
Preis: USD24/pc
MOQ: 100pcs
Lieferzeit: 15~20 work days
Marke: Changsheng
Markieren:Titanium Sputtering Targets, PVD Coating Sputtering Targets, SS 304 Sputtering Targets
Description Sputtering targets are materials from which thin films are grown by a sputtering method, and the targets are fabricated by processing metals or ceramics. We have been providing sputtering target products of a variety of materials, purities, and shapes, by combining our technologies of me... Mehr sehen
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